Electron Beam Lithography Contributions from Jena

Electron-beam litography can look back upon a successful develpment in Jena. After the year 1990, the competitive conditions have stiffened. on the other hand, it has become much easier to participate in international conferences/exhibitions and to promote a worldwide exchange of ideas and views. Numerous innovations contributed to the technical and commercial attractiveness of the Jena tools (originally introduced tothe market under the names ZBA31/32, SB250, SB350, SB3050), which found their way into many semiconductor production facilities, maskshops and research centers worldwide.